JPH0241629Y2 - - Google Patents
Info
- Publication number
- JPH0241629Y2 JPH0241629Y2 JP1982062704U JP6270482U JPH0241629Y2 JP H0241629 Y2 JPH0241629 Y2 JP H0241629Y2 JP 1982062704 U JP1982062704 U JP 1982062704U JP 6270482 U JP6270482 U JP 6270482U JP H0241629 Y2 JPH0241629 Y2 JP H0241629Y2
- Authority
- JP
- Japan
- Prior art keywords
- flat plate
- mask body
- holding frame
- mask
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/02—Exposure apparatus for contact printing
- G03B27/14—Details
- G03B27/18—Maintaining or producing contact pressure between original and light-sensitive material
- G03B27/20—Maintaining or producing contact pressure between original and light-sensitive material by using a vacuum or fluid pressure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Landscapes
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1982062704U JPS58166647U (ja) | 1982-04-28 | 1982-04-28 | 露光装置 |
US06/489,315 US4525060A (en) | 1982-04-28 | 1983-04-28 | Exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1982062704U JPS58166647U (ja) | 1982-04-28 | 1982-04-28 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58166647U JPS58166647U (ja) | 1983-11-07 |
JPH0241629Y2 true JPH0241629Y2 (en]) | 1990-11-06 |
Family
ID=13207961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1982062704U Granted JPS58166647U (ja) | 1982-04-28 | 1982-04-28 | 露光装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4525060A (en]) |
JP (1) | JPS58166647U (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2337129A (en) * | 1998-01-29 | 1999-11-10 | Steven Coe | Method and apparatus for producing graphic art |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4515521Y1 (en]) * | 1966-08-05 | 1970-06-29 | ||
GB2063523B (en) * | 1978-10-20 | 1982-12-15 | Hitachi Ltd | Wafer position setting apparatus |
JPS5729047A (en) * | 1980-07-29 | 1982-02-16 | Oodoko Seisakusho:Kk | Device for operating photosensitive plate holder of photocomposer |
US4431304A (en) * | 1981-11-25 | 1984-02-14 | Mayer Herbert E | Apparatus for the projection copying of mask patterns on a workpiece |
-
1982
- 1982-04-28 JP JP1982062704U patent/JPS58166647U/ja active Granted
-
1983
- 1983-04-28 US US06/489,315 patent/US4525060A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS58166647U (ja) | 1983-11-07 |
US4525060A (en) | 1985-06-25 |
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